IMS Researchers Partner with Applied Materials to Present at ASMC 2021


Long-term member company Applied Materials and the IMS Center partner to present at the recent 2021 Advanced Semiconductor Manufacturing Conference, held virtually on May 10-12, 2021.

This presentation, titled Combining Feature Extraction-Based and Full Trace Analysis Capabilities in Fault Detection: Methods and Comparative Analysis, focused on recent advances made through the on-going collaborative research project, funded by Applied Materials, that seeks to study and develop new methods for improving predictive maintenance, manufacturing processes, and production yield, in the semiconductor industry.

This presentation is part of Session 8—Smart Manufacturing, Advanced Process Control, Data Management, Fabless Experience, and will be available for on-demand viewing through June 11, 2021. For more information on ASMC 2021, please visit the conference website here.

For more information on the Center's work in the semiconductor manufacturing industry, please reach out to us at


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Fei Li
Haoshu Cai
Professor Jay Lee
Applied Materials